Materials Deposited by CVD

Materials Deposited by CVD

Materials Deposited by Chemical Vapor Deposition (CVD)

Ultramet specializes in the chemical vapor deposition of refractory metals and ceramics. Please contact the company for your needs and applications. The following are some of the materials with which Ultramet possesses broad experience:

Nonoxide ceramics

Tantalum carbide (TaC)
Tantalum nitride (TaN)
Tantalum diboride (TaB2)
Tungsten carbide (WC)
Tungsten diboride (WB2)
Hafnium carbide (HfC)
Hafnium nitride (HfN)
Hafnium diboride (HfB2)
Zirconium carbide (ZrC)
Zirconium nitride (ZrN)
Zirconium diboride (ZrB2)
Silicon carbide (SiC)
Silicon nitride (Si3Ni4)
Niobium carbide (NbC)
Niobium nitride (NbN)
Niobium diboride (NbB2)
Titanium carbide (TiC)
Titanium nitride (TiN)
Titanium diboride (TiB2)
Vanadium carbide (VC)
Vanadium nitride (VN)
Boron carbide (B4C)
Boron nitride (BN)


Rhenium (Re)
Tantalum (Ta)
Tungsten (W)
Niobium (Nb)
Molybdenum (Mo)
Iridium (Ir)
Platinum (Pt)
Boron (B)
Silicon (Si)
Metal alloys: W-Re, Ta-W,
Mo-Re, Ir-Pt

Oxide ceramics

Alumina (Al2O3)
Hafnia (HfO2)
Silica (SiO2)
Tantala (Ta2O5)
Titania (TiO2)
Yttria (Y2O3)
Zirconia (ZrO2)

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Chemical Vapor Deposition Variants: CVI and UVCVD

Materials Deposited by Chemical Vapor Deposition (CVD)

Inside-out Processing of Chemical Vapor Deposition (CVD)

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