Materials Deposited by CVD

Materials Deposited by CVD

Materials Deposited by Chemical Vapor Deposition (CVD)

Ultramet specializes in the chemical vapor deposition of refractory metals and ceramics. Chemical vapor deposition (CVD) results from the chemical reaction of gaseous precursor(s) at a heated substrate to yield a fully dense deposit. Ultramet uses CVD to apply refractory metals and ceramics as thin coatings on various substrates and to produce freestanding thick-walled structures. Please contact us for your specific needs and applications. The following are some of the materials with which Ultramet possesses broad experience:

Nonoxide ceramics

Tantalum carbide (TaC)
Tantalum nitride (TaN)
Tantalum diboride (TaB2)
Tungsten carbide (WC)
Tungsten diboride (WB2)
Hafnium carbide (HfC)
Hafnium nitride (HfN)
Hafnium diboride (HfB2)
Zirconium carbide (ZrC)
Zirconium nitride (ZrN)
Zirconium diboride (ZrB2)
Silicon carbide (SiC)
Silicon nitride (Si3Ni4)
Niobium carbide (NbC)
Niobium nitride (NbN)
Niobium diboride (NbB2)
Titanium carbide (TiC)
Titanium nitride (TiN)
Titanium diboride (TiB2)
Vanadium carbide (VC)
Vanadium nitride (VN)
Boron carbide (B4C)
Boron nitride (BN)


Rhenium (Re)
Tantalum (Ta)
Tungsten (W)
Niobium (Nb)
Molybdenum (Mo)
Iridium (Ir)
Platinum (Pt)
Boron (B)
Silicon (Si)
Metal alloys: W-Re, Ta-W,
Mo-Re, Ir-Pt

Oxide ceramics

Alumina (Al2O3)
Hafnia (HfO2)
Silica (SiO2)
Tantala (Ta2O5)
Titania (TiO2)
Yttria (Y2O3)
Zirconia (ZrO2)

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Chemical Vapor Deposition

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Inside-out Processing of Chemical Vapor Deposition (CVD)